Jürgen Hartmaier

Title: Jürgen Hartmaier: Innovator in Microlithography

Introduction

Jürgen Hartmaier is a notable inventor based in Oberkochen, Germany. He has made significant contributions to the field of microlithography, particularly through his innovative patents. With a total of 2 patents, Hartmaier has established himself as a key figure in the development of advanced projection exposure apparatuses.

Latest Patents

Hartmaier's latest patents include a projection lens and a microlithographic projection exposure apparatus. This apparatus is designed for microlithography and features a light source, an illumination system, a mask-positioning system, and a projection lens. The projection lens contains at least one lens made of a material with birefringence that depends on the transmission angle. Additionally, the exposure apparatus includes an optical element that has a position-dependent polarization-rotating effect or position-dependent birefringence. This element is strategically placed close to the pupil plane of the projection exposure apparatus to compensate for birefringent effects produced in the image plane by the lens.

Career Highlights

Throughout his career, Jürgen Hartmaier has worked with prominent companies in the optics and imaging industry. Notably, he has been associated with Carl Zeiss SMT AG and Carl Zeiss SMT GmbH. His work in these organizations has allowed him to contribute to cutting-edge technologies in microlithography.

Collaborations

Hartmaier has collaborated with esteemed colleagues, including Martin Brunotte and Hubert Holderer. These partnerships have further enhanced his innovative capabilities and have led to advancements in the field.

Conclusion

Jürgen Hartmaier's contributions to microlithography through his patents and collaborations highlight his importance as an inventor in the field. His work continues to influence the development of advanced optical systems.