The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2006
Filed:
Sep. 05, 2003
Applicants:
Hans Becker, Meiningen, DE;
Ute Buttgereit, Zella-Mehlis, DE;
Gunter Hess, Meiningen, DE;
Oliver Goetzberger, Meiningen, DE;
Frank Schmidt, Jena, DE;
Frank Sobel, Meiningen, DE;
Markus Renno, Meiningen, DE;
S. Jay Chey, Ossining, NY (US);
Inventors:
Hans Becker, Meiningen, DE;
Ute Buttgereit, Zella-Mehlis, DE;
Gunter Hess, Meiningen, DE;
Oliver Goetzberger, Meiningen, DE;
Frank Schmidt, Jena, DE;
Frank Sobel, Meiningen, DE;
Markus Renno, Meiningen, DE;
S. Jay Chey, Ossining, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
G01F 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention relates to attenuating phase shift mask blanks for use in lithography, a method of fabricating such a mask blank.