This inventor holds 1 USPTO granted patent. Top assignees: International Business Machines Corporation, Schott Ag. Active years: 2006.
Company Filing History:
1 out of 166,264 
1 out of 1,095 
Years Active: 2006
Title: Oliver Goetzberger: Innovator in Photomask Technology
Introduction
Oliver Goetzberger is a notable inventor based in Meiningen, Germany. He has made significant contributions to the field of lithography, particularly through his innovative work on photomask technology. His expertise and inventions have had a lasting impact on the industry.
Latest Patents
Oliver Goetzberger holds a patent for an "Attenuating phase shift mask blank and photomask." This invention relates to attenuating phase shift mask blanks used in lithography, along with a method for fabricating such a mask blank. His work in this area demonstrates his commitment to advancing technology in photomask applications.
Career Highlights
Throughout his career, Oliver has worked with prominent companies, including IBM and Schott AG. His experience in these organizations has allowed him to develop and refine his skills in the field of photomask technology. His contributions have been instrumental in driving innovation within the industry.
Collaborations
Oliver has collaborated with notable colleagues, including Gunter Hess and Frank Schmidt. These partnerships have fostered a creative environment that has led to significant advancements in their respective fields.
Conclusion
In summary, Oliver Goetzberger is a distinguished inventor whose work in photomask technology has made a significant impact on the industry. His innovative spirit and collaborations with leading companies and colleagues continue to inspire advancements in lithography.