This inventor holds 1 USPTO granted patent. Top assignees: International Business Machines Corporation, Schott Ag. Active years: 2006.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 166,351 
1 out of 1,098 
Years Active: 2006
Title: Gunter Hess - Innovator in Photomask Technology
Introduction
Gunter Hess is a notable inventor based in Meiningen, Germany. He has made significant contributions to the field of lithography, particularly through his innovative work on photomask technology. His expertise and inventions have had a lasting impact on the industry.
Latest Patents
Gunter Hess holds a patent for an "Attenuating phase shift mask blank and photomask." This invention relates to attenuating phase shift mask blanks used in lithography, along with a method for fabricating such a mask blank. His work in this area demonstrates his commitment to advancing technology in photomask applications.
Career Highlights
Throughout his career, Gunter Hess has worked with prominent companies, including Schott AG and IBM. His experience in these organizations has allowed him to develop and refine his skills in the field of photomask technology.
Collaborations
Gunter has collaborated with notable colleagues, including Frank Schmidt and Frank Sobel. These partnerships have contributed to his success and the advancement of his inventions.
Conclusion
Gunter Hess is a distinguished inventor whose work in photomask technology has made a significant impact on the industry. His patent and collaborations reflect his dedication to innovation and excellence in his field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile