This inventor holds 1 USPTO granted patent. Top assignees: International Business Machines Corporation, Schott Ag. Active years: 2006.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 166,325 
1 out of 1,096 
Years Active: 2006
Title: Ute Buttgereit: Innovator in Photomask Technology
Introduction
Ute Buttgereit is a notable inventor based in Zella-Mehlis, Germany. She has made significant contributions to the field of lithography, particularly through her innovative work on photomask technology. Her expertise and inventions have had a lasting impact on the industry.
Latest Patents
Ute Buttgereit holds a patent for an "Attenuating phase shift mask blank and photomask." This invention relates to attenuating phase shift mask blanks used in lithography, along with a method for fabricating such a mask blank. Her work in this area demonstrates her commitment to advancing technology in photomask applications.
Career Highlights
Throughout her career, Ute Buttgereit has worked with prominent companies, including Schott AG and IBM. Her experience in these organizations has allowed her to develop her skills and contribute to groundbreaking projects in the field of photomask technology.
Collaborations
Ute has collaborated with notable colleagues such as Hans Becker and Oliver Goetzberger. These partnerships have further enriched her work and expanded her influence in the industry.
Conclusion
Ute Buttgereit is a pioneering inventor whose contributions to photomask technology have made a significant impact on the field of lithography. Her innovative spirit and dedication to her work continue to inspire future generations of inventors.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile