Markus Renno

Title: Innovator Markus Renno: Pioneering Advances in EUV Lithography

Introduction

Markus Renno, an accomplished inventor based in Meiningen, Germany, has made significant contributions to the field of lithography with his innovative approaches and patented technologies. With a total of two patents to his name, his work primarily centers around developments that enhance the efficiency and effectiveness of lithographic processes.

Latest Patents

Renno's latest patents include a "Mask Blank for Use in EUV Lithography and Method for Its Production." This innovation addresses the challenges associated with mask blanks used in extreme ultraviolet (EUV) lithography. The mask blank features a substrate with a front side coated for use as a mask and a rear side that is coated with an electrically conductive layer. This coating not only enhances abrasion resistance but also ensures a strong adhesion based on German Industry Standards. Notably, the coating is applied using ion-beam-assisted sputtering, allowing for precise handling through electrostatic devices.

Another of Renno’s notable inventions is the "Attenuating Phase Shift Mask Blank and Photomask." This invention focuses on the fabrication of phase shift mask blanks that play a crucial role in improving lithographic resolution.

Career Highlights

Throughout his career, Markus Renno has held pivotal roles in prestigious companies, including Schott AG and International Business Machines Corporation (IBM). His work in these industry-leading organizations has allowed him to refine his skills and contribute substantially to the tech community.

Collaborations

Renno has collaborated with influential figures in the field, including Hans Becker and Frank Sobel. These partnerships have fostered a rich exchange of ideas and innovations, further propelling advancements in lithography technologies.

Conclusion

Markus Renno's pioneering work in developing EUV lithography tools demonstrates the importance of innovative thinking in advancing technological capabilities. His patents reflect a commitment to excellence and a forward-thinking approach to problem-solving, positioning him as a distinguished inventor in the realm of lithography.