Hans Becker

Title: Innovations of Hans Becker in EUV Lithography

Introduction

Hans Becker is a notable inventor based in Meiningen, Germany. He has made significant contributions to the field of lithography, particularly in the development of mask blanks for extreme ultraviolet (EUV) lithography. With a total of two patents to his name, Becker's work has had a substantial impact on the industry.

Latest Patents

Becker's latest patents include a mask blank for use in EUV lithography and a method for its production. This invention involves a mask blank that consists of a substrate with a front side and a rear side. A coating is applied to the front side for use as a mask in EUV lithography, while the rear side features an electrically conductive coating. This coating is designed to be abrasion resistant and strongly adhesive, adhering to German Industry Standards DIN 58196-5, DIN 58196-4, and DIN 58196-6. The electrically conductive coating is applied using ion-beam-assisted sputtering, allowing the mask blank to be handled by electrostatic holding devices without causing damage.

Another significant patent by Becker is related to attenuating phase shift mask blanks for use in lithography, along with a method for fabricating such a mask blank. These innovations are crucial for advancing the capabilities of lithographic processes.

Career Highlights

Throughout his career, Hans Becker has worked with prominent companies, including Schott AG and IBM. His experience in these organizations has contributed to his expertise in the field of lithography and mask production.

Collaborations

Becker has collaborated with notable professionals in the industry, including Frank Sobel and Markus Renno. These collaborations have likely enriched his work and led to further advancements in his inventions.

Conclusion

Hans Becker's contributions to EUV lithography through his innovative patents demonstrate his significant role in the field. His work continues to influence the development of advanced lithographic technologies.