Company Filing History:
2 out of 1,035 
1 out of 164,219 
Years Active: 2006-2009
Title: Innovations of Frank Sobel in EUV Lithography
Introduction
Frank Sobel is a notable inventor based in Meiningen, Germany. He has made significant contributions to the field of lithography, particularly in the development of mask blanks for extreme ultraviolet (EUV) lithography. With a total of two patents to his name, Sobel's work has advanced the technology used in semiconductor manufacturing.
Latest Patents
Sobel's latest patents include a mask blank for use in EUV lithography and a method for its production. This invention focuses on a mask blank that consists of a substrate with a front side and a rear side. A coating is applied to the front side for use as a mask in EUV lithography, while the rear side features an electrically conductive coating. This coating is designed to be abrasion resistant and strongly adhesive, adhering to German Industry Standards. The application of the electrically conductive coating is achieved through ion-beam-assisted sputtering, allowing for effective handling with electrostatic holding devices without causing damage.
Another significant patent is the attenuating phase shift mask blank and photomask. This invention relates to the fabrication of mask blanks that enhance the lithography process, showcasing Sobel's innovative approach to improving manufacturing techniques.
Career Highlights
Throughout his career, Frank Sobel has worked with prominent companies such as Schott AG and International Business Machines Corporation (IBM). His experience in these organizations has contributed to his expertise in the field of lithography and semiconductor technology.
Collaborations
Sobel has collaborated with notable colleagues, including Hans Becker and Markus Renno. These partnerships have likely fostered an environment of innovation and creativity, leading to advancements in their respective fields.
Conclusion
Frank Sobel's contributions to EUV lithography through his patents and collaborations highlight his role as a significant inventor in the technology sector. His work continues to influence the development of advanced manufacturing processes in the semiconductor industry.