The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2006
Filed:
Apr. 21, 2004
Zhenjiang Cui, San Jose, CA (US);
Josephine J. Chang, Carmichael, CA (US);
Alexandros T. Demos, Fremont, CA (US);
Reza Arghavani, Scotts Valley, CA (US);
Derek R. Witty, Fremont, CA (US);
Helen R. Armer, Cupertino, CA (US);
Girish A. Dixit, San Jose, CA (US);
Hichem M'saad, Santa Clara, CA (US);
Zhenjiang Cui, San Jose, CA (US);
Josephine J. Chang, Carmichael, CA (US);
Alexandros T. Demos, Fremont, CA (US);
Reza Arghavani, Scotts Valley, CA (US);
Derek R. Witty, Fremont, CA (US);
Helen R. Armer, Cupertino, CA (US);
Girish A. Dixit, San Jose, CA (US);
Hichem M'Saad, Santa Clara, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method of depositing a low dielectric constant film on a substrate and post-treating the low dielectric constant film is provided. The post-treatment includes rapidly heating the low dielectric constant film to a desired high temperature and then rapidly cooling the low dielectric constant film such that the low dielectric constant film is exposed to the desired high temperature for about five seconds or less. In one aspect, the post-treatment also includes exposing the low dielectric constant film to an electron beam treatment and/or UV radiation.