Carmichael, CA, United States of America

Josephine J Chang

This inventor holds 4 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2004-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Josephine J Chang. Retrieved from https://idiyas.com/inventor/josephine-j-chang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 75.0

Average Co-Inventor Count = 4.9

ph-index = 4

Forward Citations = 774(Granted Patents)


Location History:

  • Carmichal, CA (US) (2004)
  • Carmichael, CA (US) (2005 - 2006)
  • Sunnyvale, CA (US) (2010)

Company Filing History:


Years Active: 2004-2010

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4 patents (USPTO):Explore Patents

Title: Josephine J Chang: Innovator in UV Curing Technology

Introduction

Josephine J Chang is a prominent inventor based in Carmichael, CA (US). She has made significant contributions to the field of UV curing technology, holding a total of 4 patents. Her innovative work has advanced the efficiency and effectiveness of curing processes in various applications.

Latest Patents

One of her latest patents is for a high-efficiency UV curing system. This invention features an ultraviolet (UV) cure chamber that enables the curing of dielectric materials on substrates while also allowing for in situ cleaning. The design includes a tandem process chamber with two separate regions, each equipped with UV bulbs that emit light through aligned windows. The bulbs can be an array of light-emitting diodes or utilize sources like microwave or radio frequency. The UV light can be pulsed during the curing process, enhancing the overall efficiency. Additionally, the use of oxygen radicals and ozone for cleaning the chamber is a notable aspect of this invention.

Another significant patent involves the post-treatment of low dielectric constant films. This method includes rapidly heating the film to a high temperature and then quickly cooling it, ensuring that the exposure to high temperatures lasts for about five seconds or less. The post-treatment may also involve electron beam treatment and/or UV radiation, further enhancing the properties of the low dielectric constant film.

Career Highlights

Josephine J Chang is currently employed at Applied Materials, Inc., where she continues to innovate and develop new technologies. Her work has been instrumental in improving processes that are critical to the semiconductor and materials industries.

Collaborations

Throughout her career, Josephine has collaborated with notable colleagues, including Hichem M'Saad and Timothy Weidman. These collaborations have contributed to the advancement of her research and the successful implementation of her inventions.

Conclusion

Josephine J Chang is a trailblazer in the field of UV curing technology, with a strong portfolio of patents that reflect her innovative spirit. Her contributions continue to shape the industry and inspire future advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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