The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2010
Filed:
Jun. 15, 2006
Thomas Nowak, Sunnyvale, CA (US);
Juan Carlos Rocha-alvarez, Cupertino, CA (US);
Andrzej Kaszuba, San Jose, CA (US);
Scott A. Hendrickson, Brentwood, CA (US);
Dustin W. Ho, Fremont, CA (US);
Sanjeev Baluja, San Francisco, CA (US);
Tom Cho, Palo Alto, CA (US);
Josephine Chang, Sunnyvale, CA (US);
Hichem M'saad, Santa Clara, CA (US);
Thomas Nowak, Sunnyvale, CA (US);
Juan Carlos Rocha-Alvarez, Cupertino, CA (US);
Andrzej Kaszuba, San Jose, CA (US);
Scott A. Hendrickson, Brentwood, CA (US);
Dustin W. Ho, Fremont, CA (US);
Sanjeev Baluja, San Francisco, CA (US);
Tom Cho, Palo Alto, CA (US);
Josephine Chang, Sunnyvale, CA (US);
Hichem M'Saad, Santa Clara, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
An ultraviolet (UV) cure chamber enables curing a dielectric material disposed on a substrate and in situ cleaning thereof. A tandem process chamber provides two separate and adjacent process regions defined by a body covered with a lid having windows aligned respectively above each process region. One or more UV bulbs per process region that are covered by housings coupled to the lid emit UV light directed through the windows onto substrates located within the process regions. The UV bulbs can be an array of light emitting diodes or bulbs utilizing a source such as microwave or radio frequency. The UV light can be pulsed during a cure process. Using oxygen radical/ozone generated remotely and/or in-situ accomplishes cleaning of the chamber. Use of lamp arrays, relative motion of the substrate and lamp head, and real-time modification of lamp reflector shape and/or position can enhance uniformity of substrate illumination.