The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2005
Filed:
Oct. 11, 2001
Tetsuji Togawa, Chigasaki, JP;
Ikutaro Noji, Yokohama, JP;
Keisuke Namiki, Fujisawa, JP;
Hozumi Yasuda, Fujisawa, JP;
Shunichiro Kojima, Yokohama, JP;
Kunihiko Sakurai, Yokohama, JP;
Nobuyuki Takada, Fujisawa, JP;
Osamu Nabeya, Chigasaki, JP;
Makoto Fukushima, Yokohama, JP;
Hideki Takayanagi, Tokyo, JP;
Tetsuji Togawa, Chigasaki, JP;
Ikutaro Noji, Yokohama, JP;
Keisuke Namiki, Fujisawa, JP;
Hozumi Yasuda, Fujisawa, JP;
Shunichiro Kojima, Yokohama, JP;
Kunihiko Sakurai, Yokohama, JP;
Nobuyuki Takada, Fujisawa, JP;
Osamu Nabeya, Chigasaki, JP;
Makoto Fukushima, Yokohama, JP;
Hideki Takayanagi, Tokyo, JP;
Ebara Corporation, Tokyo, JP;
Abstract
The present invention relates to a substrate holding apparatus for holding a substrate to be polished and pressing the substrate against a polishing surface. The substrate holding apparatus comprises a top ring body for holding a substrate, an elastic pad for being brought into contact with the substrate, and a support member for supporting the elastic pad. The substrate holding apparatus further comprises a contact member mounted on a lower surface of the support member and disposed in a space formed by the elastic pad and the support member. The contact member has an elastic membrane for being brought into contact with the elastic pad. A first pressure chamber is defined in the contact member, and a second pressure chamber is defined outside of the contact member. The substrate holding apparatus further comprises a fluid source for independently supplying a fluid into, or creating a vacuum in, the first pressure chamber and the second pressure chamber.