The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 07, 2004

Filed:

Feb. 26, 2004
Applicant:
Inventors:

Takashi Hiroi, Yokohama, JP;

Maki Tanaka, Yokohama, JP;

Masahiro Watanabe, Yokohama, JP;

Asahiro Kuni, Tokyo, JP;

Yukio Matsuyama, Yokohama, JP;

Yuji Takagi, Yokohama, JP;

Hiroyuki Shinada, Chofu, JP;

Mari Nozoe, Ome, JP;

Aritoshi Sugimoto, Tokyo, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 2/300 ;
U.S. Cl.
CPC ...
G01N 2/300 ;
Abstract

A method of detecting a defect includes of determining an image acquisition condition for irradiating a converged electron beam onto a specimen and detecting a secondary electron emanated from the specimen, acquiring an image by detecting the secondary electron emanated from the specimen in synchronism with the irradiation of the electron beam, processing the acquired image to detect a defect on the specimen, and outputting information regarding the detected defect. The image acquisition condition is determined based on plural images which are acquired by changing at least one of acceleration condition of the secondary electron and an electrical field in the vicinity of the specimen.


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