The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2004
Filed:
Aug. 23, 2001
Johannes Hubertus Josephina Moors, Helmond, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Martinus Hendrikus Antonius Leenders, Rotterdam, NL;
Henri Gerard Cato Werij, Rotterdam, NL;
Hugo Matthieu Visser, Utrecht, NL;
Gerrit-Jan Heerens, Schoonhoven, NL;
Erik Leonardus Ham, Rotterdam, NL;
Hans Meiling, Bilthoven, NL;
Erik Roelof Loopstra, Heeze, NL;
Sjoerd Nicolaas Lambertus Donders, 's-Hertogenbosch, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather than the mask.