Company Filing History:
Years Active: 2004
Title: The Inventor Spotlight: Gerrit-Jan Heerens
Introduction
Gerrit-Jan Heerens is a brilliant inventor based in Schoonhoven, the Netherlands, with a keen eye for innovation in the field of lithographic projection apparatus. With one patent to his name, he has made significant contributions to the advancement of technology in his area of expertise.
Latest Patents
Heerens' patent involves a mask handling apparatus for lithographic projection apparatus, featuring a unique particle shield mechanism that utilizes electromagnetic fields to protect the mask from stray particles. The design incorporates various types of fields, including uniform electric fields, non-uniform electric fields, and optical breezes, providing efficient protection for the object being shielded.
Career Highlights
Currently employed at ASML Netherlands B.V., Heerens continues to drive innovation and push boundaries in the tech industry. His work reflects a deep understanding of lithographic processes and a commitment to developing cutting-edge solutions for complex technological challenges.
Collaborations
Heerens has had the pleasure of collaborating with esteemed colleagues such as Johannes Hubertus Josephina Moors and Vadim Yevgenyevich Banine. Together, they have shared insights, ideas, and expertise to further enhance their projects and bring their inventions to life.
Conclusion
In conclusion, Gerrit-Jan Heerens stands out as a talented inventor with a passion for revolutionizing the world of lithographic projection apparatus. His dedication to innovation, coupled with his collaborative spirit, makes him a valuable asset to the technological landscape.