Rotterdam, Netherlands

Henri Gerard Cato Werij

This inventor holds 3 USPTO granted patents. Top assignee: Asml Netherlands B.v.. Active years: 2002-2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Henri Gerard Cato Werij. Retrieved from https://idiyas.com/inventor/henri-gerard-cato-werij

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 3

Forward Citations = 84(Granted Patents)


Company Filing History:


Years Active: 2002-2007

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3 patents (USPTO):Explore Patents

Title: The Innovative Mind of Henri Gerard Cato Werij

Introduction:

Henri Gerard Cato Werij is a brilliant inventor hailing from Rotterdam, Netherlands, with a keen eye for technological advancements. With an impressive portfolio of three patents, Werij has made significant contributions to the field of lithographic apparatus and device manufacturing methods.

Latest Patents:

One of Werij's latest patents showcases his expertise in developing a lithographic apparatus designed to transfer patterns from a patterning device onto a substrate. This cutting-edge apparatus includes advanced features such as flush gas inlets, optical elements, and intricate connections to optimize the transfer process.

Another patent of Werij focuses on mask handling apparatus within lithographic projection systems. By utilizing electromagnetic fields, particularly electric fields or optical breezes, Werij ensures that objects like masks are shielded from stray particles effectively. This innovative approach enhances the overall performance and reliability of device manufacturing methods.

Career Highlights:

Werij's innovative spirit and meticulous attention to detail are exemplified through his work at ASML Netherlands B.V., a renowned technology company specializing in lithography equipment. His contributions have been instrumental in advancing the capabilities of lithographic projection apparatus and device manufacturing techniques within the industry.

Collaborations:

Throughout his career, Werij has collaborated closely with industry experts such as Johannes Hubertus Josephina Moors and Erik Leonardus Ham. Together, they have pushed the boundaries of technology and spearheaded groundbreaking developments in lithography and device manufacturing.

Conclusion:

Henri Gerard Cato Werij stands as a testament to the power of innovation and dedication in the realm of inventors. His relentless pursuit of excellence and groundbreaking inventions have not only transformed the field of lithography but also paved the way for future technological advancements. Werij's impact is sure to resonate within the industry for years to come, inspiring fellow inventors and engineers to push the boundaries of what is possible.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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