The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2026
Filed:
Oct. 01, 2021
Kla Corporation, Milpitas, CA (US);
Abdurrahman Sezginer, Monte Sereno, CA (US);
Wei Zhao, Breda, NL;
Richard Wallingford, San Jose, CA (US);
Grace Hsiu-Ling Chen, Los Gatos, CA (US);
Xuzhao Liu, Milpitas, CA (US);
Ge Cong, Pleasanton, CA (US);
Leon Yu, Milpitas, CA (US);
Kuljit Virk, Fremont, CA (US);
Bosheng Zhang, Milpitas, CA (US);
Amrish Patel, Milpitas, CA (US);
Patrick Mcbride, Davis, CA (US);
KLA Corporation, Milpitas, CA (US);
Abstract
A system includes a processing unit communicatively coupled to a detector array of an optical wafer characterization system. The processing unit is configured to perform one or more steps of a method or process including the steps of acquiring one or more target images of a target location on a wafer from the detector array, applying a de-noising filter to at least the one or more target images, determining one or more difference images from one or more reference images and the one or more target images, and up-sampling the one or more difference images to generate one or more up-sampled images. One or more wafer defects are detectable in the one or more difference images or the up-sampled images.