Milpitas, CA, United States of America

Leon Yu

This inventor holds 1 USPTO granted patent. Top assignee: Kla Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Leon Yu. Retrieved from https://idiyas.com/inventor/leon-yu-y0x1f512

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 11.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Leon Yu - Innovator in Optical Wafer Characterization

Introduction

Leon Yu is a notable inventor based in Milpitas, CA (US). He has made significant contributions to the field of optical wafer characterization. His innovative work has led to the development of a patented system that enhances the detection of wafer defects.

Latest Patents

Leon Yu holds a patent for a "System and method for optical wafer characterization with image up-sampling." This system includes a processing unit that is communicatively coupled to a detector array of an optical wafer characterization system. The processing unit is designed to perform several steps, including acquiring target images from the detector array, applying a de-noising filter, determining difference images from reference and target images, and up-sampling these images to generate up-sampled images. This technology allows for the detection of wafer defects in the difference images or the up-sampled images. He has 1 patent to his name.

Career Highlights

Leon Yu is currently employed at Kla Corporation, where he continues to work on advancements in optical technologies. His expertise in this area has positioned him as a valuable asset to his team and the company.

Collaborations

Leon collaborates with talented individuals such as Abdurrahman Sezginer and Wei Zhao. Their combined efforts contribute to the innovative projects at Kla Corporation.

Conclusion

Leon Yu's contributions to optical wafer characterization demonstrate his commitment to innovation in technology. His patented system showcases his ability to enhance defect detection in wafers, marking him as a significant figure in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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