The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 2025
Filed:
Mar. 04, 2022
Tokyo Electron Limited, Tokyo, JP;
Yuji Saegusa, Nirasaki, JP;
Tatsuya Handa, Nirasaki, JP;
Reiko Sasahara, Nirasaki, JP;
Kenshiro Asahi, Nirasaki, JP;
Kazuaki Nishimura, Nirasaki, JP;
Akihiro Yoshimura, Nirasaki, JP;
Masaki Furusawa, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
There is provided a gas treatment apparatus for performing gas treatment on a substrate. The gas treatment apparatus includes: a chamber in which the substrate is accommodated; a gas supply mechanism configured to individually supply a fluorine-containing gas and an alkaline gas; and a gas introduction member configured to cause the fluorine-containing gas and the alkaline gas supplied from the gas supply mechanism to merge with each other and introduce a mixed gas in which the fluorine-containing gas and the alkaline gas are mixed into the chamber. A portion of the gas introduction member including a merging point of the fluorine-containing gas and the alkaline gas is made of an aluminum-based material. A resin coating is formed on at least the portion including the merging point.