Company Filing History:
Years Active: 2021-2025
Title: The Innovative Contributions of Kenshiro Asahi
Introduction
Kenshiro Asahi is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of etching methods and apparatuses, holding a total of 2 patents. His work is instrumental in advancing technologies related to semiconductor manufacturing.
Latest Patents
Asahi's latest patents include an etching method and an etching apparatus. The first patent describes an etching method that involves providing a substrate with a three-layered film composed of a first silicon oxide-based film, a silicon nitride-based film, and a second silicon oxide-based film. This method allows for the collective etching of the three-layered film using a HF—NH-based gas while adjusting the gas ratio in each layer. The second patent outlines an etching method that includes disposing a substrate in a chamber, where the substrate has a silicon nitride film, a silicon oxide film, silicon, and silicon germanium. This method selectively etches the silicon nitride film with respect to the other materials by supplying a hydrogen fluoride gas into the chamber at a pressure of 1,333 Pa or more.
Career Highlights
Kenshiro Asahi is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His innovative work has contributed to the development of advanced etching techniques that are crucial for the production of high-performance electronic devices.
Collaborations
Asahi collaborates with talented coworkers, including Reiko Sasahara and Satoshi Toda. Their combined expertise fosters a creative environment that drives innovation in their projects.
Conclusion
Kenshiro Asahi's contributions to etching methods and apparatuses highlight his role as a key inventor in the semiconductor field. His patents reflect a commitment to advancing technology and improving manufacturing processes.