Company Filing History:
Years Active: 2011-2025
Title: Reiko Sasahara: Innovator in Etching Technology
Introduction
Reiko Sasahara is a prominent inventor based in Nirasaki, Japan. She has made significant contributions to the field of etching technology, holding a total of 7 patents. Her innovative work has advanced the methods and apparatus used in processing various materials.
Latest Patents
Among her latest patents is an etching method and apparatus that involves providing a substrate with a three-layered film. This film consists of a first silicon oxide-based film, a silicon nitride-based film, and a second silicon oxide-based film. The method collectively etches the three-layered film using a HF—NH-based gas while adjusting the gas ratio in each layer. Another notable patent is a method for processing an oxygen-containing workpiece. This method controls the fluorine concentration in the workpiece based on the type of fluorine-containing processing gas, processing temperature, and processing pressure.
Career Highlights
Reiko Sasahara is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. Her work at the company has been instrumental in developing advanced etching technologies that are crucial for modern manufacturing processes.
Collaborations
Throughout her career, Reiko has collaborated with notable colleagues, including Jun Tamura and Shigeru Tahara. These collaborations have fostered innovation and have contributed to the success of various projects within the company.
Conclusion
Reiko Sasahara's contributions to etching technology exemplify her dedication to innovation and excellence in her field. Her patents and work at Tokyo Electron Limited continue to influence the industry and inspire future advancements.