Location History:
- Nirasaki, JP (2010 - 2014)
- Miyagi, JP (2014)
Company Filing History:
6 out of 10,341 
1 out of 56 Years Active: 2010-2025
Title: Tatsuya Handa: Innovator in Plasma Processing Technology
Introduction
Tatsuya Handa is a notable inventor based in Nirasaki, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of five patents. His work focuses on developing advanced apparatuses and methods that enhance substrate processing.
Latest Patents
One of Handa's latest patents is a plasma processing apparatus and method. This apparatus includes a processing chamber, a lower electrode that serves as a mounting table for a target object, and an upper electrode or antenna electrode positioned opposite the lower electrode. It features a gas supply source that introduces a halogen-containing gas and oxygen gas into the chamber, along with a high-frequency power supply for generating plasma. The inner surfaces of the processing chamber exposed to plasma are coated with a fluorinated compound to improve performance.
Another significant patent is a substrate processing apparatus and electrode structure designed to prevent abnormal discharge on a substrate. This apparatus includes a housing chamber that houses the substrate and a mounting stage for the substrate. The disc-like electrode structure is connected to a high-frequency power supply and a gas supply apparatus. It contains a buffer chamber and multiple connecting sections that facilitate gas flow, ensuring efficient substrate processing.
Career Highlights
Tatsuya Handa has worked with prominent companies in the semiconductor industry, including Tokyo Electron Limited and Tocalo Co., Ltd. His experience in these organizations has contributed to his expertise in plasma processing technologies.
Collaborations
Handa has collaborated with notable professionals in his field, including Masaru Nishino and Masatsugu Makabe. These collaborations have likely enriched his research and development efforts.
Conclusion
Tatsuya Handa is a distinguished inventor whose work in plasma processing technology has led to innovative solutions in substrate processing. His patents reflect a commitment to advancing technology in this critical area.