The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2014
Filed:
Dec. 05, 2012
Tokyo Electron Limited, Tokyo, JP;
Tocalo Co., Ltd., Kobe, JP;
Masaru Nishino, Miyagi, JP;
Masatsugu Makabe, Miyagi, JP;
Nobuyuki Nagayama, Miyagi, JP;
Tatsuya Handa, Miyagi, JP;
Ryotaro Midorikawa, Miyagi, JP;
Keigo Kobayashi, Chiba, JP;
Tetsuya Niya, Chiba, JP;
Tokyo Electron Limited, Tokyo, JP;
Tocalo Co., Ltd., Kobe, JP;
Abstract
A plasma processing apparatus includes a processing chamber; a lower electrode serving as a mounting table for mounting thereon a target object; and an upper electrode or an antenna electrode provided to be opposite to the lower electrode. The apparatus further includes a gas supply source for introducing a gas including a halogen-containing gas and an oxygen gas into the processing chamber and a high frequency power supply for applying a high frequency power for generating plasma to at least one of the upper electrode, the antenna electrode, or the lower electrode. Among inner surfaces of the processing chamber which are exposed to the plasma, at least a part of or all of the surfaces between a mounting position of the target object and the upper electrode, or the antenna electrode; or at least a part of or all of the surfaces of the upper electrode or the antenna electrode are coated with a fluorinated compound.