Keigo Kobayashi

Title: Keigo Kobayashi: Innovator in Plasma Processing Technology

Introduction

Keigo Kobayashi is a notable inventor based in Chiba, Japan, recognized for his contributions to plasma processing technology. With a total of two patents to his name, Kobayashi has made significant advancements in the field, particularly in semiconductor processing.

Latest Patents

Kobayashi's latest patents include a plasma processing apparatus and method. This innovative apparatus features a processing chamber equipped with a lower electrode that serves as a mounting table for target objects. An upper electrode or antenna electrode is positioned opposite the lower electrode. The apparatus also includes a gas supply source that introduces a halogen-containing gas and oxygen gas into the processing chamber. A high-frequency power supply generates plasma by applying high-frequency power to at least one of the electrodes. Notably, the inner surfaces of the processing chamber exposed to plasma are coated with a fluorinated compound to enhance performance.

Another significant patent is the ceramic coating member for semiconductor processing apparatus. This invention aims to improve the resistance of components within semiconductor processing devices that conduct plasma etching in corrosive environments. The ceramic coating member consists of a porous layer made from an oxide of a Group IIIb element, coated on a metal or non-metal substrate. A secondary recrystallized layer of the oxide is formed on the porous layer through high-energy irradiation treatments, such as electron beam and laser beam.

Career Highlights

Throughout his career, Keigo Kobayashi has worked with prominent companies in the semiconductor industry, including Tokyo Electron Limited and Tocalo Co., Ltd. His experience in these organizations has contributed to his expertise in plasma processing technologies.

Collaborations

Kobayashi has collaborated with notable coworkers, including Yoshiyuki Kobayashi and Takahiro Murakami. Their joint efforts have further advanced the field of plasma processing.

Conclusion

Keigo Kobayashi's innovative work in plasma processing technology has made a significant impact on the semiconductor industry. His patents reflect a commitment to enhancing the efficiency and effectiveness of processing apparatuses.