The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2010
Filed:
Mar. 20, 2007
Yoshiyuki Kobayashi, Tokyo, JP;
Takahiro Murakami, Tokyo, JP;
Yoshio Harada, Akashi, JP;
Junichi Takeuchi, Kobe, JP;
Ryo Yamasaki, Kakogawa, JP;
Keigo Kobayashi, Funabashi, JP;
Yoshiyuki Kobayashi, Tokyo, JP;
Takahiro Murakami, Tokyo, JP;
Yoshio Harada, Akashi, JP;
Junichi Takeuchi, Kobe, JP;
Ryo Yamasaki, Kakogawa, JP;
Keigo Kobayashi, Funabashi, JP;
Tokyo Electron Limited, Tokyo, JP;
Tocalo Co., Ltd., Kobe-shi, JP;
Abstract
Improving the resistance of members and parts disposed inside of vessels such as semiconductor processing devices for conducting plasma etching treatment in a strong corrosive environment. A ceramic coating member for a semiconductor processing apparatus comprises a porous layer made of an oxide of an element in Group IIIb of the Periodic Table coated directed or through an undercoat on the surface of the substrate of a metal or non-metal and a secondary recrystallized layer of the oxide formed on the porous layer through an irradiation treatment of a high energy such as electron beam and laser beam.