Company Filing History:
2 out of 10,346 
1 out of 56 Years Active: 2014-2023
Title: The Innovations of Masatsugu Makabe
Introduction
Masatsugu Makabe is a notable inventor based in Miyagi, Japan. He has made significant contributions to the field of etching methods and plasma processing apparatuses. With a total of two patents to his name, Makabe's work has advanced the technology used in semiconductor manufacturing.
Latest Patents
Makabe's latest patents include an etching method and a substrate processing apparatus. The etching method involves mounting a substrate on a stage within a processing chamber, where the substrate consists of a laminate film. This method includes supplying process gas, which contains fluorocarbon or hydrofluorocarbon gas, to the chamber. It also involves selecting a surface temperature range based on the materials of the silicon-containing insulating layer and the underlying layer. The process culminates in forming plasma to etch the silicon-containing insulating layer effectively. His plasma processing apparatus features a processing chamber, a lower electrode for mounting target objects, and an upper electrode or antenna electrode. This apparatus is designed to introduce halogen-containing gas and oxygen gas into the chamber, generating plasma through high-frequency power.
Career Highlights
Throughout his career, Masatsugu Makabe has worked with prominent companies such as Tokyo Electron Limited and Tocalo Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to innovative technologies in the semiconductor industry.
Collaborations
Makabe has collaborated with notable individuals in his field, including Masaru Nishino and Nobuyuki Nagayama. These collaborations have further enriched his work and expanded the impact of his inventions.
Conclusion
Masatsugu Makabe's contributions to etching methods and plasma processing apparatuses have significantly influenced semiconductor manufacturing technology. His innovative spirit and collaborative efforts continue to inspire advancements in the field.