The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2025
Filed:
Jun. 04, 2021
Kla Corporation, Milpitas, CA (US);
John Charles Robinson, Austin, TX (US);
Stilian Pandev, Santa Clara, CA (US);
Shifang Li, Pleasanton, CA (US);
Mike Von Den Hoff, Munich, DE;
Justin Lach, Portage, MI (US);
Barry Saville, Gansevoort, GB;
David W. Price, Austin, TX (US);
Robert J. Rathert, Mechanicsville, VA (US);
Chet V. Lenox, Lexington, TX (US);
Thomas Groos, Mengerskirchen, DE;
Oreste Donzella, San Ramon, CA (US);
KLA Corporation, Milpitas, CA (US);
Abstract
A die screening system may receive die-resolved metrology data for a population of dies on one or more samples from the one or more in-line metrology tools after one or more fabrication steps, where the die-resolved metrology data includes images generated using one or more measurement configurations of the one or more in-line metrology tools. In this way, the die-resolved metrology data provides many measurement channels per die, where a particular measurement channel includes data from a particular pixel of a particular image. The controller may then generate screening data for the population of dies from the die-resolved metrology data, where the screening data includes a subset of the plurality of measurement channels of the die-resolved metrology data, and screen the plurality of dies into two or more disposition classes including at least outlier dies based on variability in the screening data.