Mike Von Den Hoff

Title: Mike Von Den Hoff: Innovator in Inline Metrology

Introduction

Mike Von Den Hoff is a notable inventor based in Munich, Germany. He has made significant contributions to the field of inline metrology, holding a total of 4 patents. His work focuses on improving the accuracy and efficiency of die screening systems and inspection tools.

Latest Patents

One of his latest patents is titled "Imaging Reflectometry for Inline Screening." This invention involves a die screening system that utilizes die-resolved metrology data from inline metrology tools. The system generates screening data that categorizes dies into various disposition classes, including outlier dies based on variability in the data. Another significant patent is "Advanced Inline Part Average Testing." This inspection system identifies defects in a population of dies and assigns weights to these defects, predicting their impact on reliability. The system generates defectivity scores and isolates outlier dies from the population.

Career Highlights

Mike has worked with prominent companies in the industry, including KLA-Tencor Technologies Corporation and KLA Corporation. His experience in these organizations has allowed him to develop innovative solutions that enhance the reliability of semiconductor manufacturing processes.

Collaborations

Some of his notable coworkers include Ingrid B. Peterson and David W. Price. Their collaboration has contributed to advancements in the field of inline metrology.

Conclusion

Mike Von Den Hoff is a distinguished inventor whose work in inline metrology has led to significant advancements in die screening and inspection systems. His contributions continue to impact the semiconductor industry positively.