The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 2024
Filed:
Feb. 18, 2021
Kla-tencor Corporation, Milpitas, CA (US);
Barak Bringoltz, Rishon Le Tzion, IL;
Evgeni Gurevich, Yoqneam Ylit, IL;
Ido Adam, Qiriat Ono, IL;
Yoel Feler, Haifa, IL;
Dror Alumot, Rehovot, IL;
Yuval Lamhot, Haifa, IL;
Noga Sella, Migdal Haemek, IL;
Yaron De Leeuw, Yehud, IL;
Tal Yaziv, Kiryat Haim, IL;
Eltsafon Ashwal-Island, Haifa, IL;
Lilach Saltoun, Qiriat Ono, IL;
Tom Leviant, Yoqneam Illit, IL;
Abstract
Methods, metrology modules and target designs are provided, which improve the accuracy of metrology measurements. Methods provide flexible handling of multiple measurement recipes and setups and enable relating them to landscape features that indicate their relation to resonance regions and to flat regions. Clustering of recipes, self-consistency tests, common processing of aggregated measurements, noise reduction, cluster analysis, detailed analysis of the landscape and targets with skewed cells are employed separately or in combination to provide cumulative improvements of measurement accuracy.