Migdal Haemek, Israel

Noga Sella

USPTO Granted Patents = 4 

 

Average Co-Inventor Count = 8.7

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Migdal Haernek, IL (2020)
  • Migdal Haemek, IL (2020 - 2024)

Company Filing History:


Years Active: 2020-2024

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4 patents (USPTO):Explore Patents

Title: Noga Sella: Innovator in Optical Metrology

Introduction

Noga Sella is a prominent inventor based in Migdal Haemek, Israel. She has made significant contributions to the field of optical metrology, holding a total of 4 patents. Her work focuses on improving measurement accuracy and efficiency in semiconductor manufacturing processes.

Latest Patents

One of her latest patents involves accuracy improvements in optical metrology. This patent provides methods, metrology modules, and target designs that enhance the accuracy of metrology measurements. The methods allow for flexible handling of multiple measurement recipes and setups, relating them to landscape features that indicate their connection to resonance regions and flat regions. Techniques such as clustering of recipes, self-consistency tests, common processing of aggregated measurements, noise reduction, and detailed analysis of the landscape and targets with skewed cells are employed to achieve cumulative improvements in measurement accuracy.

Another notable patent addresses overlay measurement using multiple wavelengths. This method determines overlay ('OVL') in a pattern during semiconductor wafer manufacturing. It involves capturing images from a metrology target formed in at least two different layers of the wafer, with parts of the target offset in opposing directions. The images are captured using radiation of multiple wavelengths, and a first and second differential signal is determined for respective pixels in each image. The OVL for the pattern is then calculated as a weighted average of the OVL of the respective pixels.

Career Highlights

Noga Sella has worked with notable companies in the industry, including Kla Tencor Corporation and Kla Corporation. Her experience in these organizations has allowed her to develop and refine her innovative approaches to optical metrology.

Collaborations

Throughout her career, Noga has collaborated with talented individuals such as Ido Adam and Yuval Lamhot. These collaborations have contributed to her success and the advancement of her inventions.

Conclusion

Noga Sella is a distinguished inventor whose work in optical metrology has led to significant advancements in measurement accuracy and efficiency. Her contributions continue to impact the semiconductor manufacturing industry positively.

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