Yoqneam, Israel

Evgeni Gurevich

This inventor holds 1 USPTO granted patent and 1 published patent application. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Evgeni Gurevich. Retrieved from https://idiyas.com/inventor/evgeni-gurevich-9yojrd61

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 12.0

ph-index = 1


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Innovations in Optical Metrology by Evgeni Gurevich

Introduction

Evgeni Gurevich is a notable inventor based in Yoqneam Ylit, Israel. He has made significant contributions to the field of optical metrology, focusing on improving measurement accuracy. His innovative approaches have the potential to enhance various applications in metrology.

Latest Patents

Gurevich holds a patent for "Accuracy improvements in optical metrology." This patent outlines methods, metrology modules, and target designs that enhance the accuracy of metrology measurements. The methods he developed allow for flexible handling of multiple measurement recipes and setups. They also enable the correlation of these setups to landscape features, which indicate their relationship to resonance regions and flat regions.

Career Highlights

Throughout his career, Gurevich has employed various techniques such as clustering of recipes, self-consistency tests, and common processing of aggregated measurements. His work also includes noise reduction and cluster analysis. These methods, used separately or in combination, provide cumulative improvements in measurement accuracy.

Collaborations

Gurevich has collaborated with notable coworkers, including Barak Bringoltz and Ido Adam. Their joint efforts have contributed to the advancements in optical metrology.

Conclusion

Evgeni Gurevich's innovative work in optical metrology demonstrates his commitment to enhancing measurement accuracy through advanced methods and collaborative efforts. His contributions are valuable to the field and pave the way for future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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