The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 2023
Filed:
Dec. 06, 2019
The 59th Institute of China Ordnance Industry, China, CN;
Lin Zheng, China, CN;
Shitao Dou, China, CN;
Changguang He, China, CN;
Zhengkun Peng, China, CN;
Yong Xiao, China, CN;
Lunwu Zhang, China, CN;
Jin Zhang, China, CN;
Xianhe Feng, China, CN;
THE 59TH INSTITUTE OF CHINA ORDNANCE INDUSTRY, Chongqing, CN;
Abstract
A diffraction apparatus and a method for non-destructively testing internal crystal orientation uniformity of a workpiece are provided. The apparatus includes: an X-ray irradiation system for irradiating an X-ray to a measured part of a sample under testing, and an X-ray detection system for simultaneously detecting a plurality of diffracted X-rays formed by diffraction of a plurality of parts of the sample under testing, to measure an X-ray diffraction intensity distribution of the sample under testing, where the detected diffracted X-rays are short-wavelength characteristic X-rays, and the X-ray detection system is an array detection system. By the apparatus and the method, the detection efficiency is greatly improved.