Saitama, Japan

Zongtao Ge

This inventor holds 16 USPTO granted patents and 6 published patent applications and 4 EPO patents, primarily in Optical Measurement. Top assignees: Fujinon Corporation, Fuji Photo Optical Co., Ltd.. Active years: 2003-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Zongtao Ge. Retrieved from https://idiyas.com/inventor/zongtao-ge

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 16 

% Patents Active = 31.3

 

Average Co-Inventor Count = 1.3

ph-index = 4

Forward Citations = 43(Granted Patents)


Location History:

  • Omiya, JP (2003 - 2004)
  • Saitama, JP (2003 - 2011)

Company Filing History:


Years Active: 2003-2011

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Areas of Expertise:
Optical Wave Interference
Interferometer Apparatus
Wavefront Measurement
Fringe Analysis
Low Coherent Interference
Fourier Transform
Sample Inclination
Eccentricity Measurement
Posture Detection
Optical Pickup
Phase Shift Analysis
Error Correction
16 patents (USPTO):Explore Patents

Title: Zongtao Ge: Innovator in Optical Measurement Technologies

Introduction

Zongtao Ge is a prominent inventor based in Saitama, Japan. He has made significant contributions to the field of optical measurement technologies, holding a total of 16 patents. His innovative work has advanced the understanding and application of optical wave interference measurement.

Latest Patents

Among his latest patents is an optical wave interference measuring apparatus. This invention involves changing the relative position of a test surface from a reference position where the surface central axis aligns with a measurement optical axis. The measurement optical axis is moved sequentially to various annular regions obtained by dividing the test surface in a diametric direction. The test surface rotates on a rotation axis whenever the relative position changes. Measurement light composed of a plane wave is radiated to the rotating test surface, and a one-dimensional image sensor captures interference fringes at each of the rotational positions. The shape information of each annular region is calculated based on the captured interference fringes, and this information is connected to determine the shape of the entire measurement region.

Another notable patent is similar in nature, where the relative position of the test surface is changed from a reference position. In this case, measurement light that travels while being converged by a Mirau objective interference optical system is used. The same process of capturing interference fringes and calculating shape information applies, showcasing the innovative approach Zongtao Ge has taken in his inventions.

Career Highlights

Zongtao Ge has worked with notable companies such as Fujinon Corporation and Fuji Photo Optical Co., Ltd. His experience in these organizations has contributed to his expertise in optical technologies and measurement systems.

Collaborations

Throughout his career, Zongtao Ge has collaborated with talented individuals, including Takayuki Saito and Fumio Kobayashi. These collaborations have likely enriched his work and led to further advancements in his field.

Conclusion

Zongtao Ge's contributions to optical measurement technologies through his patents and collaborations highlight his role as an influential inventor. His innovative approaches continue to shape the future of optical measurement systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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