Zijie Hua

Title: Innovations of Zijie Hua in Dark-Field Confocal Microscopy

Introduction

Zijie Hua is a prominent inventor based in Harbin, China. He has made significant contributions to the field of optical precision measurement, particularly in dark-field confocal microscopy. With a total of 8 patents to his name, his work has advanced the capabilities of microscopy technology.

Latest Patents

Hua's latest patents include a "Dark-field confocal microscopy measurement apparatus based on vortex interference." This invention relates to optical precision measurement and provides a dark-field confocal microscopy measurement apparatus that utilizes vortex interference. The apparatus features a vortex light generation module that produces vortex light with a predetermined order. Additionally, a vortex light interference module divides the vortex light into reference light and imaging light, allowing for the measurement of sample reflection light and the characterization of defects through phase information.

Another notable patent is the "Dark-field confocal microscopy measurement apparatus and method based on multi-fractional angular momentum demodulation." This invention includes a modulated illumination module and a signal collection and demodulation module. The modulated illumination module generates vortex light with different fractional orders, which is used to scan the sample. The signal collection and demodulation module collects the reflected light to create dark-field images, ultimately enhancing the signal-to-noise ratio through cross-correlation processing.

Career Highlights

Zijie Hua is affiliated with the Harbin Institute of Technology, where he continues to innovate and contribute to the field of microscopy. His work has garnered attention for its practical applications in various scientific and industrial settings.

Collaborations

Hua has collaborated with notable colleagues, including Jian Liu and Chenguang Liu, who have contributed to his research endeavors.

Conclusion

Zijie Hua's innovative work in dark-field confocal microscopy has significantly advanced the field of optical precision measurement. His patents reflect a commitment to enhancing microscopy technology, making him a key figure in this area of research.