Tokyo, Japan

Zhongxin Wen

USPTO Granted Patents = 3 

Average Co-Inventor Count = 4.2

ph-index = 1


Company Filing History:


Years Active: 2020-2024

Loading Chart...
3 patents (USPTO):Explore Patents

Title: Innovations by Zhongxin Wen

Introduction

Zhongxin Wen is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of optical film-thickness measurement and substrate processing. With a total of 3 patents to his name, his work has advanced the technology used in various industrial applications.

Latest Patents

One of his latest patents is a method of cleaning an optical film-thickness measuring system. This invention relates to a method for cleaning an optical sensor head used for measuring the film thickness of substrates, such as wafers, during the polishing process. The method involves supplying a rinsing liquid into a through-hole formed in a polishing pad before or after polishing, ensuring the optical sensor head remains clean and functional.

Another significant patent is for a substrate processing apparatus and method of detecting indentations formed in a substrate. This polishing device includes a substrate stage that holds the substrate, a processing head for surface processing, and an indentation detecting system. The system is designed to detect the position of indentations in the substrate by measuring changes in physical quantities, such as pressure or flow rate, when a fluid is injected around the substrate's edge.

Career Highlights

Zhongxin Wen is currently employed at Ebara Corporation, a leading company in the field of fluid machinery and environmental engineering. His work at Ebara has allowed him to focus on innovative solutions for substrate processing and optical measurement technologies.

Collaborations

He has collaborated with notable coworkers, including Nobuyuki Takahashi and Toru Maruyama. Their combined expertise has contributed to the development of advanced technologies in their respective fields.

Conclusion

Zhongxin Wen's contributions to the field of optical measurement and substrate processing are noteworthy. His innovative patents reflect his commitment to advancing technology in these areas. His work continues to influence the industry and pave the way for future innovations.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…