The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2024
Filed:
Dec. 16, 2019
Ebara Corporation, Tokyo, JP;
Nobuyuki Takahashi, Tokyo, JP;
Toru Maruyama, Tokyo, JP;
Taichi Yokoyama, Tokyo, JP;
Zhongxin Wen, Tokyo, JP;
EBARA CORPORATION, Tokyo, JP;
Abstract
The present invention relates to a method of cleaning an optical film-thickness measuring system used for measuring a film thickness of a substrate, such as a wafer, while polishing the substrate. The method includes: cleaning an optical sensor head () by supplying a rinsing liquid into a through-hole () formed in a polishing pad () on a polishing table () before or after polishing of a substrate (W) with use of slurry, the optical sensor head () being located below the through-hole (); and discharging the rinsing liquid from the through-hole () through a drain line ().