Shanghai, China

Zhifeng Gao


Average Co-Inventor Count = 8.5

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2016-2018

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4 patents (USPTO):Explore Patents

Title: Innovations by Zhifeng Gao in Semiconductor Cleaning Technologies

Introduction

Zhifeng Gao is a prominent inventor based in Shanghai, China, known for his contributions to semiconductor cleaning technologies. With a total of four patents to his name, Gao has made significant advancements in methods and apparatus for cleaning semiconductor wafers. His innovative approaches have the potential to enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Gao's latest patents focus on methods for cleaning semiconductor substrates using ultra/mega sonic devices. One of his notable inventions involves a method that includes holding a semiconductor substrate with a chuck, positioning an ultra/mega sonic device adjacent to the substrate, and injecting a chemical liquid onto the substrate and the gap between the substrate and the device. The method also involves changing the gap between the semiconductor substrate and the ultra/mega sonic device for each rotation of the chuck during the cleaning process. This gap can be adjusted by 0.5/N for each rotation, where N is an integer between 2 and 1000. The gap varies within a specific range during the cleaning process, optimizing the cleaning efficiency.

Career Highlights

Zhifeng Gao is currently employed at Acm Research (Shanghai) Inc., where he continues to develop innovative solutions for the semiconductor industry. His work has garnered attention for its practical applications and potential to improve manufacturing processes.

Collaborations

Gao collaborates with talented individuals in his field, including Jian Wang and Sunny Voha Nuch. These collaborations enhance the innovative environment at Acm Research and contribute to the development of cutting-edge technologies.

Conclusion

Zhifeng Gao's contributions to semiconductor cleaning technologies demonstrate his commitment to innovation and excellence in the field. His patents reflect a deep understanding of the challenges in semiconductor manufacturing and offer practical solutions to enhance efficiency.

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