Zhenxing Li

Title: Zhenxing Li: Innovator in Semiconductor Technology

Introduction

Zhenxing Li is a prominent inventor based in Hefei, China. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches to fabrication processes.

Latest Patents

One of his latest patents is titled "Method for forming capacitor via." This method involves providing a to-be-processed wafer that includes a substrate, a first dielectric layer, and a first mask layer. The process includes etching the first mask layer according to a compensated first etching parameter to create a first patterned layer. Subsequently, a second dielectric layer and a second mask layer are formed, followed by etching these layers to create a second patterned layer. Finally, the first dielectric layer is etched using both patterned layers to form a capacitor via.

Another notable patent is the "Method and device for determining fabrication chamber." This invention provides a method and device for determining a fabrication chamber based on the current radio frequency power time of each chamber. It allows for the direct determination of fabrication chambers for target objects in the next process step, enhancing efficiency in semiconductor manufacturing.

Career Highlights

Zhenxing Li is currently employed at Changxin Memory Technologies, Inc., where he applies his expertise in semiconductor fabrication. His work has been instrumental in advancing the company's technological capabilities and product offerings.

Collaborations

He collaborates with talented coworkers, including Chunyang Wang and Bo Shao, who contribute to the innovative environment at Changxin Memory Technologies.

Conclusion

Zhenxing Li's contributions to semiconductor technology through his patents and work at Changxin Memory Technologies highlight his role as a key innovator in the industry. His inventions continue to influence the development of advanced fabrication techniques.