Zhaosheng Meng

Title: The Innovative Mind of Zhaosheng Meng

Introduction

Zhaosheng Meng is a notable inventor hailing from Qingdao, China. With a remarkable portfolio of five patents, Meng has made significant contributions to the field of integrated circuits and semiconductor technology. His work focuses on enhancing the performance and reliability of copper interconnects within CMOS devices, showcasing his dedication to innovation in technology.

Latest Patents

Meng's latest patents illustrate his commitment to advancing semiconductor fabrication techniques. One of his key inventions is a Cu interconnect and a method for forming this interconnect using a dual damascene process. This innovation features a barrier layer designed with either a metal crystal adhesion layer or a graphene layer. The metal crystal adhesion layer, which may consist of materials like cobalt (Co), ruthenium (Ru), or osmium (Os), significantly enhances the adhesion of copper while inhibiting its diffusion toward dielectric layers. This not only promotes electro-migration of copper but also improves the overall reliability of the interconnect.

Another groundbreaking patent involves a method for forming contacts with multiple depths in CMOS devices by utilizing an enhanced carbon-enriched etching stop layer. This method protects shallower contact holes from over-etching during the etching process, thereby ensuring that deeper holes can be fully processed without compromising the integrity of the less deep contacts. Such innovations are critical for improving manufacturing efficiencies and device performance.

Career Highlights

Zhaosheng Meng has worked with reputable organizations in the technology sector, most notably at Sien Integrated Circuits Co., Ltd and Shandong University. His roles in these institutions have allowed him to apply his expertise in semiconductor design and fabrication, significantly impacting the industry's technological landscape.

Collaborations

Throughout his career, Meng has collaborated with prominent professionals in the field, including Min-Hwa Chi and Zhuangzhuang Wu. These partnerships have fostered an environment of shared innovation, pushing the boundaries of what is possible in semiconductor technology.

Conclusion

Zhaosheng Meng's inventive spirit and dedication to enhancing integrated circuit technology make him a significant figure in the realm of innovation. With multiple patents to his name and a track record of collaboration, his contributions continue to shape the future of semiconductor fabrication. His work exemplifies the power of innovation in driving technological advancements.