Yuuki Yoshida

Title: Innovations of Yuuki Yoshida

Introduction

Yuuki Yoshida is a notable inventor based in Naka-gun, Japan. He has made significant contributions to the field of materials science, particularly in the development of sputtering targets. With a total of 3 patents to his name, Yoshida's work has implications for various technological applications.

Latest Patents

Yoshida's latest patents include innovative methods for producing sputtering targets. One of his patents describes a sputtering target composed of a Cu—Ga sintered compact that has a reduced oxygen content, which helps suppress abnormal discharges. This invention features a component composition with a Ga content of 20 atomic % or higher and less than 30 atomic %, with the balance being Cu and inevitable impurities. The oxygen content is limited to 100 ppm or lower, and the average grain size is 100 μm or less. The target exhibits diffraction peaks assigned to the γ and δ phases of CuGa, with the main peak intensity of the δ phase being 10% or higher relative to that of the γ phase.

Another patent focuses on a Cu—Ga alloy sputtering target, which also aims to reduce oxygen content and suppress abnormal discharging. This invention presents a sintered body with a texture where Na compound phases are dispersed in a matrix containing the γ and δ phases of a Cu—Ga alloy. The component composition includes 20 atomic % to 30 atomic % of Ga and 0.05 atomic % to 10 atomic % of Na, with Cu as the balance. The average grain size of the γ phase ranges from 30 μm to 100 μm, while the Na compound phases have an average grain size equal to or less than 8.5 μm.

Career Highlights

Yuuki Yoshida is currently employed at Mitsubishi Materials Corporation, where he continues to innovate in the field of materials science. His work has been instrumental in advancing the technology related to sputtering targets, which are crucial for various applications in electronics and materials engineering.

Collaborations

Yoshida has collaborated with notable colleagues, including Kouichi Ishiyama and Satoru Mori. Their combined expertise has contributed to the successful development of innovative materials and methods.

Conclusion

Yuuki Yoshida's contributions to the field of materials science, particularly through his patents on sputtering