Tsukuba, Japan

Yuuki Ishida


Average Co-Inventor Count = 6.7

ph-index = 2

Forward Citations = 20(Granted Patents)


Company Filing History:


Years Active: 2012-2023

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3 patents (USPTO):Explore Patents

Title: Yuuki Ishida: Innovator in Cleanroom Technology and Epitaxial Substrates

Introduction

Yuuki Ishida is a prominent inventor based in Tsukuba, Japan. He has made significant contributions to the fields of cleanroom technology and semiconductor materials. With a total of three patents to his name, Ishida's work is recognized for its innovative approaches and practical applications.

Latest Patents

One of Ishida's latest patents is the "Encapsulated Cleanroom System." This system comprises a processing chamber and a storage section where the processing chamber is stored. During operation, the pressure in the storage section is either lower or higher than the pressures in the processing chamber and the exterior space. This design effectively prevents the entry of outside gases into the processing chamber while also stopping the leakage of gases from the processing chamber to the exterior space.

Another notable patent is for an "Epitaxial SiC Single Crystal Substrate and Method of Manufacture." This invention includes a SiC single crystal wafer with a main surface that is a c-plane or slightly inclined. The SiC epitaxial film formed on this wafer has a dislocation array density of threading edge dislocation arrays that is 10 arrays/cm or less, showcasing Ishida's focus on high-quality semiconductor materials.

Career Highlights

Yuuki Ishida has worked with esteemed organizations such as the National Institute of Advanced Industrial Science and Technology and Showa Denko K.K. His experience in these institutions has allowed him to develop and refine his innovative ideas, contributing to advancements in technology.

Collaborations

Ishida has collaborated with notable colleagues, including Kenji Momose and Michiya Odawara. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Yuuki Ishida's contributions to cleanroom systems and semiconductor substrates highlight his role as a key innovator in his field. His patents reflect a commitment to advancing technology and improving industrial processes.

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