Location History:
- Kumamoto, JP (1994 - 1995)
- Kumamoto-ken, JP (1998)
- Uto, JP (1993 - 1999)
- Koshimachi, JP (1999)
Company Filing History:
11 out of 10,341 
5 out of 13 
5 out of 85 
Years Active: 1993-1999
Title: Yuuji Kamikawa: Innovator in Substrate Washing Technologies
Introduction
Yuuji Kamikawa is a prominent inventor based in Uto, Japan. He has made significant contributions to the field of substrate washing technologies, holding a total of 12 patents. His innovative methods and apparatus have advanced the efficiency and effectiveness of substrate processing in various industries.
Latest Patents
Among his latest patents, Kamikawa has developed a substrate washing method that includes several key steps. This method involves introducing a washing solution into a processing vessel, allowing wafers to be held collectively by a chuck, and dipping the wafers into the washing solution. The process continues with transferring the wafers onto a wafer boat, moving them within the washing solution, and discharging the used washing solution. Additionally, he has patented a washing apparatus that features a washing chamber, an opening/closing mechanism, and a nozzle for effective cleaning of objects transported into the chamber.
Career Highlights
Throughout his career, Yuuji Kamikawa has worked with notable companies such as Tokyo Electron Limited and Tokyo Electron Saga Limited. His experience in these organizations has allowed him to refine his skills and contribute to the development of advanced washing technologies.
Collaborations
Kamikawa has collaborated with esteemed colleagues, including Hiroshi Tanaka and Mitsuo Nishi. These partnerships have fostered innovation and have been instrumental in the successful development of his patented technologies.
Conclusion
Yuuji Kamikawa's work in substrate washing technologies exemplifies his dedication to innovation and excellence. His patents and career achievements highlight his significant impact on the industry.