Company Filing History:
Years Active: 1985-1988
Title: **Innovator Yutaka Yamamura: Pioneering Advances in Exposure Development Technology**
Introduction
Yutaka Yamamura is an accomplished inventor based in Osaka, Japan. With a remarkable portfolio of three patents, he has made significant contributions to the field of exposure development technology. His innovative designs have enhanced processes that involve photopolymerization and image formation.
Latest Patents
Yutaka Yamamura's latest patents include the following:
1. **Exposure Development Device for Long Base Member**
This device comprises a long base member exposing section that efficiently handles the exposure of image-forming long base members while ensuring continuous operation. It incorporates a synchronous connection section that detects the length of the image-forming member, allowing for seamless feeding. Moreover, the continuous peel development section works to retain the exposed photopolymerizable composition layer on the substrate, enabling uninterrupted image formation.
2. **Peeling Type Developing Apparatus**
This invention details a method and apparatus designed to remove exposed photoresist from printed circuit boards. The process begins with the application of a photopolymerization compound layer over the printed circuit board, followed by a transparent support layer. After exposure, an adhesive tape is applied diagonally across the board. Using pinch rolls and a peeling bar, the tape, along with the support layer and unexposed photoresist, is efficiently removed from the printed circuit board.
Career Highlights
Yutaka Yamamura has dedicated a considerable portion of his career to Nitto Electric Industrial Co., Ltd., where he showcases his expertise in developing advanced exposure devices. His role within the company has allowed him to drive innovation and implement cutting-edge technologies in the field of photolithography.
Collaborations
Throughout his career, Yutaka has collaborated with several talented individuals, including Chiharu Miyaake and Akio Tsumura. Together, they have worked on various projects, contributing to the development of state-of-the-art devices and methods that enhance imaging technology.
Conclusion
Yutaka Yamamura is a distinguished inventor whose work in exposure development technology continues to influence the industry. With his innovative patents and valuable collaborations, he has made substantial strides in enhancing methods for image formation and photopolymerization. His ongoing contributions bear testament to his commitment to technological advancement and innovation.