The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 1988
Filed:
Jul. 25, 1986
Nitto Electric Industrial Co., Ltd., Osaka, JP;
Abstract
An exposure development device for long base member is disclosed, comprising: a long base member exposing section which repeats the operations of exposing an image forming long base member in the long size state, the image forming long base member being prepared by laminating an image forming material comprising a transparent support having adhered thereon a photopolymerizable composition layer on a long substrate on the surface of which an image is formed, and intermittently feeding the exposed image forming long base member; a synchronous connection section which detects a length of the image forming long base member intermittently fed from the exposing section and continuously feeds the image forming long base member; and a continuous peel development section which continuously peels the transparent support and non-exposed portions of the photopolymerizable composition layer of the image forming long base member continuously fed from the synchronous section, from the long substrate to retain the exposed photopolymerizable composition layer thereon, whereby an image is formed continuously on the long substrate.