Nitto Electric Industrial Co., Ltd.

Yutaka Yamamura

Chiharu Miyaake

Shunichi Hayashi

Akio Tsumura

Shun-ichi Hayashi

Tomomichi Kaneko

Kazuo Oouchi

Kazuo Ohuchi

An exposure development device for long base member is disclosed, comprising: a long base member exposing section which repeats the operations of exposing an image forming long base member in the long size state, the image forming long base member being prepared by laminating an image forming material comprising a transparent support having adhered thereon a photopolymerizable composition layer on a long substrate on the surface of which an image is formed, and intermittently feeding the exposed image forming long base member; a synchronous connection section which detects a length of the image forming long base member intermittently fed from the exposing section and continuously feeds the image forming long base member; and a continuous peel development section which continuously peels the transparent support and non-exposed portions of the photopolymerizable composition layer of the image forming long base member continuously fed from the synchronous section, from the long substrate to retain the exposed photopolymerizable composition layer thereon, whereby an image is formed continuously on the long substrate.

Exposure development device for long base member

A peeling type developing method and apparatus for removing exposed photoresist from printed circuit boards. The printed circuit board is covered with a photopolymerization compound layer and then a transparent support layer. After exposure, a thin adhesive tape is stuck to the support layer extending obliquely across the board and crossing opposite corners thereof. The adhesive tape, together with the support layer and the unexposed portions of the photoresist material, are peeled off the printed circuit board by a pair of pinch rolls with the aid of a peeling bar in line contact with the substrate through the adhesive tape and the support layer.

Peeling type developing apparatus

A method of peel development comprising laminating an image-forming material comprising a transparent support and a photopolymerizable composition layer on the surface of a substrate on which an image is formed, imagewise exposing the image-forming material, and peeling the support from the substrate together with the unexposed areas of the photopolymerizable composition layer while leaving the exposed areas thereof on the substrate, wherein the cohesive strength of the photopolymerizable composition layer is set such that the force required to separate the unexposed areas from the exposed areas is at least 1.0 kg/mm.sup.2 and the peeling operation is performed while maintaining a peel angle (.alpha.) of the support to the substrate within the range of 0.degree.&lt;.alpha..ltoreq.90.degree.. This method enables the formation of sharp images on the substrate while allowing for the easy separation of the unexposed areas from the exposed areas.

Method of peel development

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Osaka, Japan

Yutaka Yamamura