The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 12, 1985

Filed:

Mar. 30, 1984
Applicant:
Inventors:

Yutaka Yamamura, Osaka, JP;

Tomomichi Kaneko, Osaka, JP;

Shunichi Hayashi, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03F / ;
U.S. Cl.
CPC ...
430253 ; 156234 ;
Abstract

A method of peel development comprising laminating an image-forming material comprising a transparent support and a photopolymerizable composition layer on the surface of a substrate on which an image is formed, imagewise exposing the image-forming material, and peeling the support from the substrate together with the unexposed areas of the photopolymerizable composition layer while leaving the exposed areas thereof on the substrate, wherein the cohesive strength of the photopolymerizable composition layer is set such that the force required to separate the unexposed areas from the exposed areas is at least 1.0 kg/mm.sup.2 and the peeling operation is performed while maintaining a peel angle (.alpha.) of the support to the substrate within the range of 0.degree.<.alpha..ltoreq.90.degree.. This method enables the formation of sharp images on the substrate while allowing for the easy separation of the unexposed areas from the exposed areas.


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