Tokyo, Japan

Yuta Seki

This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignee: Hitachi High-Tech Analysis Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuta Seki. Retrieved from https://idiyas.com/inventor/yuta-seki-qurl6eaw

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 50.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Yuta Seki: Innovator in X-ray Inspection Technology

Introduction

Yuta Seki is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of X-ray inspection technology. His innovative approach has led to the development of advanced methods for accurately inspecting flexible samples.

Latest Patents

Yuta Seki holds a patent for an X-ray inspection apparatus and method of inspection with X-rays. This invention addresses the challenge of inspecting foreign objects in samples that may bend, sag, or curve. The apparatus includes an X-ray source that irradiates the sample, an X-ray detection unit positioned opposite the source, and a sample support mechanism designed to accommodate flexible samples.

Career Highlights

Yuta Seki is associated with Hitachi High-Tech Analysis Corporation, where he applies his expertise in developing cutting-edge inspection technologies. His work has been instrumental in enhancing the accuracy and reliability of X-ray inspections in various applications.

Collaborations

Some of Yuta Seki's notable coworkers include Satoshi Matsubara and Tsuneo Sato. Their collaborative efforts contribute to the advancement of innovative technologies within the company.

Conclusion

Yuta Seki's contributions to X-ray inspection technology exemplify the impact of innovation in enhancing inspection methods. His work continues to influence the field and improve the accuracy of inspections in flexible materials.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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