Location History:
- Yokohama, JP (2007 - 2016)
- Tokyo, JP (2014 - 2018)
Company Filing History:
Years Active: 2007-2018
Title: Yuriko Seino: Innovator in Pattern Formation Technologies
Introduction
Yuriko Seino is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of pattern formation, holding a total of 13 patents. His work focuses on innovative methods and materials that enhance the capabilities of pattern formation technologies.
Latest Patents
One of Yuriko Seino's latest patents is a pattern formation method. This method involves creating a base structure that includes first and second guide portions, each containing a pinning portion and a neutral portion. The process includes forming a block copolymer film with first and second polymers on the base structure. A predetermined treatment is then performed on the block copolymer film, resulting in the formation of distinct pattern portions made from the first and second polymers. Additionally, the fifth pattern portion comprises multiple first portions formed from the second polymer and a second portion made from the first polymer, strategically placed on the neutral portion and the first portions.
Another notable patent is related to a self-organization material and pattern formation method. This material includes a block copolymer and a top coat material. The block copolymer consists of a first block and a second block, with the second block exhibiting a higher surface free energy than the first. The top coat material features two portions: one with a surface free energy higher than the first block and lower than the second, and another with a lower surface free energy than the first block. The first portion can be a homopolymer or a random copolymer, while the second portion may consist of an organic siloxane-containing polymer or a fluorine-containing polymer.
Career Highlights
Yuriko Seino is currently employed at Kabushiki Kaisha Toshiba, where he continues to innovate and develop new technologies. His work has significantly impacted the field of materials science and engineering, particularly in the area of pattern formation.
Collaborations
Yuriko has collaborated with notable colleagues, including Shigeki Hattori and Hiroko Nakamura. Their combined expertise has contributed to the advancement of their projects and the successful development of innovative solutions.
Conclusion
Yuriko Seino is a distinguished inventor whose work in pattern formation technologies has led to numerous patents and advancements in the field. His contributions continue to shape the future of materials science and engineering.
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