The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2014
Filed:
Feb. 22, 2012
Satoshi Mikoshiba, Yamato, JP;
Koji Asakawa, Kawasaki, JP;
Hiroko Nakamura, Yokohama, JP;
Shigeki Hattori, Yokohama, JP;
Atsushi Hieno, Kawasaki, JP;
Tsukasa Azuma, Kawasaki, JP;
Yuriko Seino, Yokohama, JP;
Masahiro Kanno, Yokohama, JP;
Satoshi Mikoshiba, Yamato, JP;
Koji Asakawa, Kawasaki, JP;
Hiroko Nakamura, Yokohama, JP;
Shigeki Hattori, Yokohama, JP;
Atsushi Hieno, Kawasaki, JP;
Tsukasa Azuma, Kawasaki, JP;
Yuriko Seino, Yokohama, JP;
Masahiro Kanno, Yokohama, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
According to one embodiment, there is provided a method of forming a pattern including forming a polymer layer on a substrate, the polymer layer including a first and second regions, selectively irradiating either of the first and second regions with energy rays or irradiating the first and second regions with energy rays under different conditions to cause a difference in surface free energy between the first and second regions, thereafter, forming a block copolymer layer on the polymer layer, and causing microphase separation in the block copolymer layer to simultaneously form first and second microphase-separated structures on the first and second regions, respectively.