The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2015
Filed:
Sep. 25, 2012
Atsushi Hieno, Kawasaki, JP;
Shigeki Hattori, Yokohama, JP;
Hiroko Nakamura, Yokohama, JP;
Satoshi Mikoshiba, Yamato, JP;
Koji Asakawa, Kawasaki, JP;
Masahiro Kanno, Yokohama, JP;
Yuriko Seino, Yokohama, JP;
Tsukasa Azuma, Kawasaki, JP;
Atsushi Hieno, Kawasaki, JP;
Shigeki Hattori, Yokohama, JP;
Hiroko Nakamura, Yokohama, JP;
Satoshi Mikoshiba, Yamato, JP;
Koji Asakawa, Kawasaki, JP;
Masahiro Kanno, Yokohama, JP;
Yuriko Seino, Yokohama, JP;
Tsukasa Azuma, Kawasaki, JP;
KABUSHIKI KAISHA TOSHIBA, Tokyo, JP;
Abstract
According to one embodiment, there is provided a method of forming a pattern, including forming a thermally crosslinkable molecule layer including a thermally crosslinkable molecule on a substrate, forming a photosensitive composition layer including a photosensitive composition on the thermally crosslinkable molecule layer, chemically binding the thermally crosslinkable molecule to the photosensitive composition by heating, selectively irradiating the photosensitive composition layer with energy rays, forming a block copolymer layer including a block copolymer on the photosensitive composition layer, and forming a microphase-separated structure in the block copolymer layer.